Effect of Oxygen Deposition Pressure on the Structure and the Metal Insulator Transition in Pulsed Laser Deposited VO₂ Films on Soda Lime Glass

NM Ndiaye¹, M Thiam¹, BD Ngom^{1, 2,} , O Sakho¹, M Chaker³, N Manyala⁴ and AC Beye¹

¹Laboratory of Photonics and Nano-Fabrication, Solid State and Materials Sciences Group (GPSSM), Faculty of Sciences and Technics, University of Cheikh Anta Diop of Dakar (UCAD) B.P. 25114 Dakar-Fann Dakar (Senegal)

²National Institute for Scientific Research, Center: Energy-Materials-Telecommunications, 1650, Boul. Lionel Boulet, Varennes (Québec) J3X 1S2
UNESCO-UNISA Africa Chair in Nanosciences/Nanotechnology, College of Graduate Studies, University of South Africa (UNISA), Muckleneuk Ridge, Pretoria 2000, South Africa
Nanosciences African Network (NANOAFNET), iThemba LABS, National Research Foundation of South Africa, Somerset West 7129, Western Cape, South Africa

³National Institute for Scientific Research, Center: Energy-Materials-Telecommunications, 1650, Boul. Lionel Boulet, Varennes (Québec) J3X 1S2

⁴Department of Physics, SARChI Chair in Carbon Technology and Materials, Institute of Applied Materials, University of Pretoria, Pretoria, South Africa

Cite this paper:
NM Ndiaye, M Thiam, BD Ngom, O Sakho, M Chaker, N Manyala and AC Beye. Effect of Oxygen Deposition Pressure on the Structure and the Metal Insulator Transition in Pulsed Laser Deposited VO₂ Films on Soda Lime Glass. American Journal of Nanomaterials. 2017; 5(2):59-67. doi: 10.12691/ajn-5-2-3

Abstract

Vanadium dioxide thin films nanostructures were synthesized by pulsed laser deposition on soda lime glass at a substrate temperature of 600°C and the effects of the oxygen deposition pressure on the crystalline structure and the phase transition characteristics of VO₂ nanostructured films were investigated. The structure and microstructure of the films have been examined by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Results indicate that the crystal structure of the films is strongly sensitive to the oxygen deposition pressure; exhibiting sharp a-axis diffraction peaks, showing a texturation along (1 0 0) plane. A detailed description of the growth mechanisms and the substrate–film interaction is given, and the characteristics of the electronic transition and hysteresis of the phase transition are described in terms of the morphology, grain boundary structure and crystal orientation. The sharpness of the transition and the hysteresis upon heating and cooling are found to be strong functions of the crystal structure and microstructure (grain size).

Keywords:
B. Crystal growth A. Optical Material A. Thin Films C. X-ray Diffraction D. Phase Transition

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