Structural and Optical Properties of (Li_xNi_2-xO₂) Thin Films Deposited by Pulsed Laser Deposited (PLD) Technique at Different Doping Ratio

Khalid. H. Razeg¹, Muthafar. F. AL-Hilli², Abed. A. Khalefa^1, and Kadhim A. Aadim²

¹Department of Physics, University of Tikrit, College of Education

²Department of Physics, University of Baghdad, College of Sciences

Cite this paper:
Khalid. H. Razeg, Muthafar. F. AL-Hilli, Abed. A. Khalefa and Kadhim A. Aadim. Structural and Optical Properties of (Li_xNi_2-xO₂) Thin Films Deposited by Pulsed Laser Deposited (PLD) Technique at Different Doping Ratio. International Journal of Physics. 2017; 5(2):46-52. doi: 10.12691/ijp-5-2-3

Abstract

This paper study (Li_xNi_2-xO₂) thin films with different value of x (x = 0.0, 0.15, 0.25, 0.35 and 0.45) prepared by pulse laser deposition technique (PLD) on a glass bases and annealed to (350°C). Using X-ray diffraction (XRD) and atomic force microscopy (AFM) to study the properties of synthetic and show that the (NiO) film has face centre cubic structure (fcc), while the (Li_xNi_2-xO₂) films of the ratio (0.15 to 0.45) has a hexagonal installation and grain size increase with the doping. Optical properties studied within the specified range of wavelengths (300-1100nm), it's found that the energy gap and transmittance decrease while absorbance and extinction coefficient increase with the doping.

Keywords:
(Li_xNi_2-xO₂) thin film (PLD) Technique Optical Properties

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