Electrodeposition of Nanostructured ZnO Thin Film: A Review

Manish Kumar^1, and C. Sasikumar¹

¹Department of Material Science & Metallurgical Engineering, MANIT, Bhopal, India

Cite this paper:
Manish Kumar and C. Sasikumar. Electrodeposition of Nanostructured ZnO Thin Film: A Review. American Journal of Materials Science and Engineering. 2014; 2(2):18-23. doi: 10.12691/ajmse-2-2-2

Abstract

In this review paper, a critical analysis was carried out to investigate the effect of cathodic potential, bath temperature, time and nature of substrates on the ZnO thin films synthesized by electrodeposition technique. XRD patterns of the various deposited films were studied to examine the structural characteristics of the Nanostructured ZnO thin films. From the XRD patterns of the different ZnO thin films, it is found that the nanostructured ZnO film had hexagonal wurtzite crystal structure and the crystals were preferably grown along the (002) or (101) planes. The optical properties: Band gaps, transmittance of films, deposited on ITO/FTO coated glass substrates, were also studied by the various optical transmittance spectra. The band gap energy of the deposited ZnO thin films found varying from 3.18 to 3.85eV. Annealing of electrodeposited films decreased the bandgap considerably. Depending on the crystal size, the transmittance of the nanostructured ZnO thin film was found to be about 70 to 90%.

Keywords:
ZnO thin film electrodeposition nanostructures band gap energy preferred orientation

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