Application of PhotoStress Method in the Analysis of Stress Fields Around a Notch

Peter Frankovský^1, , Pavol Zubko², Oskar Ostertag¹ and Martin Šmida¹

¹Department of Applied Mechanics and Mechatronics, Faculty of Mechanical Engineering, Technical University of Košice, Košice, Slovakia

²Department of Material Science, Faculty of Metallurgy, Technical University of Košice, Košice, Slovakia

Cite this paper:
Peter Frankovský, Pavol Zubko, Oskar Ostertag and Martin Šmida. Application of PhotoStress Method in the Analysis of Stress Fields Around a Notch. American Journal of Mechanical Engineering. 2013; 1(7):329-334. doi: 10.12691/ajme-1-7-35

Abstract

The presented paper aims at the analysis of stress fields which occur while applying loads to a photoelastically coated notched sample. The analysis was done by means of PhotoStress^® method using reflection polariscope and digital video camera. On the notched sample subject to loads by eccentric tension we determined the differences of principal normal stresses in specified point at loads 3 kN, 4.5 kN, 6 kN, 9 kN and 12 kN. In addition, we determined the value of principal normal stress at the edge of the sample during load of 12 kN which was later compared with numerical solution in programme SolidWorks. On the photo elastically coated sample we observed maximum elongation of the coating, too. As regards maximum elongation of applied photoelastic coating PS-1A, the manufacturer states the value of 5%.

Keywords:
notch stress field photoelastic coating PhotoStress^® method

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References:

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