Serrano Pérez Edgar^1,, Serrano Pérez Javier², José Manuel Juárez García³, Juárez López Fernando¹

The chemical vapor deposition is an attractive technique for the growth of thin films and coatings, mainly focused in applications of wear protection, corrosion and microelectronic. This technique has received special attention because allows to deposit thin films and coatings on complex substrates with irregular geometry. The laboratory experiment presented includes a delivery system based on an electro mechanical injector, denominated direct liquid injection, an updated variant of the classical chemical vapor deposition process with the aim of providing a more constant vapor phase for the process. Although it’s numerous advantages, the high price for this equipment represents a barrier for the widespread of this technique in academic environments. The accessible materials used for this experiment setup allows building the setup in laboratories and facilities of universities and research centers focused on nanotechnology and materials science. The experiment setup has been successfully build and is used as a compressive hands-on tool to teach undergraduate, master and doctorate students the direct liquid injection chemical vapor deposition technique.

direct liquid injection, chemical vapor deposition, alumina