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Application of PhotoStress Method in the Analysis of Stress Fields Around a Notch

by Peter Frankovský, Pavol Zubko, Oskar Ostertag and Martin Šmida

American Journal of Mechanical Engineering. 2013, 1(7), 329-334. DOI: 10.12691/ajme-1-7-35
Pub. Date: November 08, 2013Views: 38174 Downloads: 32948Like: 43Citations: 1

notch stress field photoelastic coating PhotoStress^® method

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