Science and Education Publishing American Journal of Mechanical Engineering 1 7 2013 11 01 Application of PhotoStress Method in the Analysis of Stress Fields Around a Notch 329 334 EN Peter Frankovsky Department of Applied Mechanics and Mechatronics, Faculty of Mechanical Engineering, Technical University of Košice, Košice, Slovakia Pavol Zubko Oskar Ostertag Władysław Papacz Martin Šmida AJME20131735 10.12691/ajme-1-7-35 2013 10 03 2013 10 11 2013 11 01 The presented paper aims at the analysis of stress fields which occur while applying loads to a photoelastically coated notched sample. The analysis was done by means of PhotoStress® method using reflection polariscope and digital video camera. On the notched sample subject to loads by eccentric tension we determined the differences of principal normal stresses in specified point at loads 3 kN, 4.5 kN, 6 kN, 9 kN and 12 kN. In addition, we determined the value of principal normal stress at the edge of the sample during load of 12 kN which was later compared with numerical solution in programme SolidWorks. On the photo elastically coated sample we observed maximum elongation of the coating, too. As regards maximum elongation of applied photoelastic coating PS-1A, the manufacturer states the value of 5%.